A family of synthetic quartz (fused silica) glass grades, each tuned for a specific role in ArF excimer-laser photolithography, LCD stepper optics, or other deep-UV lithography systems. All share the same chemical foundation, 100% SiO₂ with negligible metal-impurity content, but differ in optical transmission, thermal, and 193 nm laser-durability properties.
Common properties across the family
- High transmittance for deep-UV light from i-line (365 nm) through KrF (248 nm), ArF (193 nm), and Xe excimer lamps (172 nm), and into the near-infrared.
- Excellent compaction/rarefaction and polarization-induced birefringence (PIB) characteristics.
- Resistance to heat processing around 1,000°C.
- Durability against high-energy laser beams. Critical for 193 nm excimer laser systems where bulk damage accumulates over millions of pulses.
- Thermal expansion as low as 1/10 that of conventional glasses.
- High uniformity and low OH-group content.
- Outstanding chemical resistance and low dielectric loss.
Grade selection
| Grade | Features | Primary applications |
|---|---|---|
| AQ | Standard grade | Photomask substrates, glass wafers, illumination optics |
| AQ3 | High transmittance in wide wavelengths | Xe excimer lamp (172 nm) |
| QJ | AQ-enhanced uniformity of refractive index | Projection optics for i-line (365 nm) |
| AQ2 | High resistance against deep-UV excimer laser, highly uniform R.I. | Projection optics for ArF excimer laser (193 nm) |
| AQT | Very high resistance against deep-UV excimer laser beam | Illumination optics for ArF excimer laser (193 nm) |
| AQR | AQ-enhanced purity, metallic impurity content assured | Glass wafer for high-temperature, high-purity processes |
| QC-i | High transmittance for deep-UV excimer laser & low birefringence | Photomask substrate for ArF immersion system |
For full transmission spectra and laser-durability curves, contact our Hillsboro team.
Applications
- Photomask substrates and glass wafers (AQ grade)
- Illumination optics for ArF excimer laser at 193 nm (AQT grade)
- Projection optics for ArF excimer laser at 193 nm (AQ2 grade)
- Projection optics for i-line at 365 nm (QJ grade)
- Photomask substrate for ArF immersion system (QC-i grade)
- Xe excimer lamp applications at 172 nm (AQ3 grade)
- Glass wafer for high-temperature, high-purity processes (AQR grade)
Documents
Documents available on request. Use the form below.
Specifications
Synthetic Quartz for ArF & LCD Steppers specifications
Related materials
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AQ / QJ Grade
Quartz Wafers
Square and round high-purity synthetic-quartz wafers in AQ and QJ grades, 4–12 inches, 0.5–3.0 mm thick.
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AQ Grade
Photomask Substrates
AQ-grade synthetic quartz substrates engineered for photomask manufacturing. Sub-100nm flatness per side and exceptionally low defect counts.