AQ-grade synthetic quartz photomask substrates engineered to the requirements of leading photomask manufacturers. These are also offered as photomask blanks for downstream coating and patterning. Two characteristics dominate the qualification list:
- Flatness below 100nm per side. Essential for sub-resolution lithography where any departure from perfect flatness translates directly to focus error.
- Low defect counts. Minimized scratches, pits, and inclusions across the substrate surface.
The base material is the same AQ synthetic fused quartz used across the photolithography product family, with surface polishing and flatness control optimized for the photomask application.
Applications
- Photomasks for ArF, KrF, and i-line photolithography
- Photomask blanks for next-generation lithography
Documents
Documents available on request. Use the form below.
Specifications
Photomask Substrates specifications
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